Intel: Novel methods of fabrication of ferroelectric structures that can be switched with low energy
שם: |
Intel: Novel methods of fabrication of ferroelectric structures that can be switched with low energy תאריך הגשה: 04/03/22 לאתר הקול הקורא |
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תיאור כללי: |
Intel’s University Research & Collaboration Office (URC) invites proposals to explore material/structure solutions and methods of fabrication towards realization of <0.2V switching, energy efficient (EE) ferroelectric FET (FEFET). Intel intends to fund a new collaborative, multi-university research center addressing three Research Vectors (RVs): RV1. Deposition of ferroelectrics RV2. Interfaces with ferroelectrics RV3. Integration of a complete FEFET Funding: ~$150K/year over up to 3 years. This typically supports 1-2 graduate students advised by 1-2 PIs. We expect to receive roughly 20 proposals and award 3-4 grants. * Intel is unable to receive proposals under an obligation of confidentiality. All proposals submitted should therefore include only public information. * RFP Information Sessions: Intel staff will host 1-3 conference calls to answer questions and clarify information on the RFP. The first session will be held virtually on JAN 26th 10-11am PST. If interested, please send an email request, and meeting details will be shared. (sowmya.venkataramani@intel.com) |
מקור: | ישראלי |
תקציב: | ~$150K/year over up to 3 years |
מס' שנים למחקר: | 3 |
איש קשר: | Robi, 2152, robertg@trdf.technion.ac.il; iris 1272, irisbr@campus.technion.ac.il |
תחומים: | מדעים מדויקים |
סוג הקרן: | הקרן אינה קרן תחרותית. |
קרן ופרופילים משויכים: | אינטל ,פתוח לחברי סגל הטכניון בלבד. אנא התחבר\י כדי לצפות בפרופילי המימון של הקרן (בפינה הימנית העליונה). |